Mark D. Losego, Professor of Materials Science and Engineering (MSE), has been elected to Fellow of the AVS (formerly the American Vacuum Society), citing his “pioneering contributions to understanding the kinetics and mechanisms of inorganic vapor infiltration of polymers to synthesize novel hybrid materials, and for dedicated service to the vapor phase processing community."

The AVS is the premier research society for studying surfaces, interfaces, and materials processing in vacuum and other environments. Election to Fellow is a prestigious designation given only to a select set of members who have demonstrated sustained and outstanding scientific contributions to the research fields of interest to the Society. Losego was one of only five Society members to be elected to Fellow this year.

“It is truly an honor to be recognized by my colleagues for the research contributions our group of many dedicated student and postdoctoral researchers have made over the past 12 years at Georgia Tech,” said Losego. “I have long been passionate about the fundamental science of vapor processing, vacuum science, surfaces, and interfaces, and to be recognized by the premier society for these research areas is incredibly special.”

Losego has directed fundamental research efforts in the vapor-phase processing of materials for over a decade at Georgia Tech, training numerous graduate and undergraduate students in vapor deposition techniques and vacuum equipment, with many pursuing careers at Fortune 500 semiconductor manufacturing companies. More than 100 graduate students have also benefited from his graduate course in the practice and science of vapor deposition processing.

His research is known to be “off-beat” in the vapor-phase processing community, often pursuing vapor modification of commodity products such as plastics, textiles, and lumber, rather than traditional uses like semiconductor manufacturing and hard coatings. However, his fundamental studies of those process kinetics and chemical mechanisms have revealed underlying insights that have had broad impact across many application spaces. Losego has also been deeply involved in service to the AVS for over a decade, serving in multiple roles for the Thin Film Division, including Treasurer and Chair, and over the past two years serving as co-chair and chair for the Society’s premier annual conference, the AVS71 and AVS72 International Symposium and Exhibition.

Losego’s election to Fellow will be recognized on Monday, November 9, 2026, at the AVS72 annual awards ceremony in Pittsburgh, PA.