MSE Seminar - Professor Grant Willson - University of Texas
Title: Block Co-Polymers and High Resolution Patterning
Various incredibly clever process tricks based on chemical principles have been devised that extend the resolution limits of photolithography, some of which are already in use in full scale manufacturing. One promising approach is based on the directed self-assembly of block co-polymers. We have tried to design block co-polymers that are optimized for this application and capable of forming structures with minimum dimensions below 100 Angstroms in width. Doing so requires blocks with very high interaction parameters, X, and for some applications, incorporation of silicon in one of the blocks. Polymers of this sort form very small structures, but aligning the structures and orienting them in a way that is useful for microelectronics has been a challenge. For example, achieving orientation by a long solvent annealing process is simply not compatible with the serial nature of microelectronics manufacturing as it is currently practiced and the structures once formed must be useful for patterning a variety of materials including insulators, semiconductors and conductors. We have therefore worked to develop new high X block copolymers and processes that enable very fast, thermal annealing of these materials. A progress report on our design, synthesis and process development efforts will be presented.
Dr. Grant Willson joined the faculties of the Departments of Chemical Engineering and Chemistry at The University of Texas at Austin in 1993 where he holds the Rashid Engineering Regent’s Chair. He received his B.S. and Ph.D. in organic chemistry from the University of California, Berkeley, and an M.S. degree in Organic Chemistry from San Diego State University. He came to the University of Texas from his position as an IBM Fellow and Manager of the Polymer Science and Technology area at the IBM Almaden Research Center in San Jose, California. He joined IBM after serving on the faculties of California State University, Long Beach and the University of California, San Diego. Willson is a member of the ACS, AIChE, APS, SPIE, ASEE, SPE and Sigma Xi and is a member of the National Academy of Engineering. He is an associate editor of ACS NANO and serves on the advisory board for several journals in materials science. He is the co-author of more than 400 journal publications, editor
and author of several books and co-inventor on more than 40 issued patents. He also is a co-founder of Molecular Imprints, Inc. in Austin Texas. Willson’s research can be characterized as the design and synthesis of functional organic materials with more recent emphasis on materials that undergo specific interactions with radiation. These include monomeric and polymeric liquid crystalline materials, polymeric non-linear optical materials, novel
photoresist materials, etc. His work has been recognized by the Gordon E. Moore Medal from the Electro-Chemical Society, the SEMI North America Award, the SPIE Frits Zernike Award, the Arthur Doolittle,the Chemistry of Materials, Applied Polymer Science, the Heroes in Chemistry, Cooperative Research and the Carothers Awards from the American Chemical Society and the Alexander von Humboldt Senior Scientist Award from the Federal Republic of Germany. He also received the SRC Technical Excellence Award, the SRC Aristotle Award, the Malcolm E. Pruitt Award The Kosar Award, the Zernike Award and other honors. He was the recipient of the National Academy of Sciences Award for Chemistry in Service to Society. He was elected a Fellow of IBM, SPIE and MRS and was an inaugural Fellow of the ACS. President George W. Bush presented him with the 2007 National Medal of Technology and Innovation. In 2013 he was awarded the Japan Prize.
Host: Zhiqun Lin