Jayaraman and Park provide pattern for DIY form fitting, comfortable mask

Jayaraman and Park provide pattern for DIY form fitting, comfortable mask

Professor Sudaresan Jayaraman and Sungmee Park, Ph.D. have designed a new reusable fabric face mask intended to protect wearers and those around them, be comfortable enough to wear all day, and stay in place without frequent adjustment. They are providing the plans so individuals and manufacturers can make the masks.

For a pattern that allows you to create a mask yourself, visit -  https://sites.gatech.edu/rapid-response/formfitting/